2.830J / 6.780J / ESD.63J Control of Manufacturing Processes

Spring 2008

A Si stamp patterned with grids of varying orientations and linewidths is used to stamp PMMA.
To create embossed microstructures in PMMA, the silicon stamp must be carefully patterned and manufactured. (Image courtesy of Hayden Taylor. Used with permission.)

Course Description

This course explores statistical modeling and control in manufacturing processes. Topics include the use of experimental design and response surface modeling to understand manufacturing process physics, as well as defect and parametric yield modeling and optimization. Various forms of process control, including statistical process control, run by run and adaptive control, and real-time feedback control, are covered. Application contexts include semiconductor manufacturing, conventional metal and polymer processing, and emerging micro-nano manufacturing processes.

Special Features

Technical Requirements

Special software is required to use some of the files in this course: .jmp, .mp4 and .xls.


*Some translations represent previous versions of courses.

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Staff

Instructors:
Prof. Duane Boning
Prof. David Hardt

Course Meeting Times

Lectures:
2 sessions / week
1.5 hours / session

Level

Graduate

*Translations